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Semiconductor Etching Gas
Hexafluoroisobutylene (HFIB) is an environmentally friendly dry etching gas with low GWP, mainly used in front end etching process of semiconductor.
Special Features:
Ultra High Purity Tailored To Your Requirements
Excellent Etching Rate & Selectivity
Low GWP Etching Gas for Semiconductor Manufacturing
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Hexafluoroisobutylene |
Synonyms | 2-Trifluoromethyl-3,3,3-trifluoropropene; HFIB |
CAS # | 382-10-5 |
ELINCS # (EU) | 206-840-6 |
Molecular Formula | C4H2F6 |
Molecular Weight | 164.05 |
Product Description
Chemical Name | Hexafluoroisobutylene |
Synonyms | 2-Trifluoromethyl-3,3,3-trifluoropropene; HFIB |
CAS # | 382-10-5 |
ELINCS # (EU) | 206-840-6 |
Molecular Formula | C4H2F6 |
Molecular Weight | 164.05 |