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High Purity Semiconductor Etching Gas

Hexafluoro-1,3-butadiene (C4F6, also known as perfluorobutadiene, HFBD) is used as an environmentally friendly etching gas with a low greenhouse effect, mainly in dry etching processes for semiconductors.

Special Features:  

  • Used as a dry etching gas in silicon-based integrated circuits

  • Many application advantages in plasma, ion beam or sputter dry etching in semiconductor devices manufacturing.

  • High aspect ratio etching

Product Availability

Sample

Available

Commercial

Available

ISO Tank

Available

Custom Packaging

Upon Request


Product Description

Chemical Name

Hexafluoro-1,3-butadiene

Synonyms

Perfluorobutadiene

CAS #

685-63-2

ELINCS # (EU)

211-681-0

Molecular Formula

C4F6

Structure

CF2=CF-CF=CF2

Color

Colorless

Odor

Odorless

ODP

0

GWP100

< 1


Product Description

Chemical Name

Hexafluoro-1,3-butadiene

Synonyms

Perfluorobutadiene

CAS #

685-63-2

ELINCS # (EU)

211-681-0

Molecular Formula

C4F6

Structure

CF2=CF-CF=CF2

Color

Colorless

Odor

Odorless

ODP

0

GWP100

< 1


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