C4F6
High Purity Semiconductor Etching Gas
Hexafluoro-1,3-butadiene (C4F6, also known as perfluorobutadiene, HFBD) is used as an environmentally friendly etching gas with a low greenhouse effect, mainly in dry etching processes for semiconductors.
Special Features:
Used as a dry etching gas in silicon-based integrated circuits
Many application advantages in plasma, ion beam or sputter dry etching in semiconductor devices manufacturing.
High aspect ratio etching
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Hexafluoro-1,3-butadiene |
Synonyms | Perfluorobutadiene |
CAS # | 685-63-2 |
ELINCS # (EU) | 211-681-0 |
Molecular Formula | C4F6 |
Structure | CF2=CF-CF=CF2 |
Color | Colorless |
Odor | Odorless |
ODP | 0 |
GWP100 | < 1 |
Product Properties
Chemical Name | Hexafluoro-1,3-butadiene |
Molecular Weight | 162 |
Boiling Point(℃) | 6 |
Vapor Pressure (bar, @20℃） | 1.77 |
Critical Temperature（℃） | 139.6 |
Critical Pressure (kPa） | 3.23 |
Vapor Density (Air=1) | 1.553 |
Water Solubility | Insoluble |
Flash Point | Not Applicable |
Flammability | Flammable |
Explosion Limits | Lower 7%, Upper 73% |