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Difluoromethane | Semiconductor Etching Gas
Difluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom | Available |
Product Description
Chemical Name | Difluoromethane |
Synonyms | Carbon difluoride, HFC-32, R32 |
CAS # | 75-10-5 |
ELINCS # (EU) | 200-839-4 |
Molecular Formula | CH2F2 |
Structure | CH2F2 |
Molecular Weight | 52.02 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 675 |
Atmospheric Life Time (Years) | 5 |
TWA（8-hr, mg/m³） | 2.5 |
Product Description
Chemical Name | Difluoromethane |
Synonyms | Carbon difluoride, HFC-32, R32 |
CAS # | 75-10-5 |
ELINCS # (EU) | 200-839-4 |
Molecular Formula | CH2F2 |
Structure | CH2F2 |
Molecular Weight | 52.02 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 675 |
Atmospheric Life Time (Years) | 5 |
TWA（8-hr, mg/m³） | 2.5 |
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