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Plasma Etching Gas
Octafluorocyclobutane is an important etching gas in the plasma etching process of the electronics industry.
Special Features:
Ultra High Purity Tailored To Your Requirements
Excellent Etching Rate & Selectivity
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Octafluorocyclobutane |
Synonyms | Perfluorocyclobutane, R-C318 |
CAS # | 115-25-3 |
ELINCS # (EU) | 204-075-2 |
Molecular Formula | CC4F8 |
Structure |
|
Molecular Weight | 200.03 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 3200 |
Atmospheric Life Time (Days) | 10300 |
Product Description
Chemical Name | Octafluorocyclobutane |
Synonyms | Perfluorocyclobutane, R-C318 |
CAS # | 115-25-3 |
ELINCS # (EU) | 204-075-2 |
Molecular Formula | CC4F8 |
Structure |
|
Molecular Weight | 200.03 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 3200 |
Atmospheric Life Time (Days) | 10300 |