Plasma Etching Gas
Pentafluoroethane is an important etching gas in the plasma etching process of the electronics industry.
Special Features:
Ultra High Purity Tailored To Your Requirements
Excellent Etching Rate & Selectivity
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom Packaging | Upon Request |
Product Description
Chemical Name | Pentafluoroethane |
Synonyms | HFC 125, Khladon 125, Suva 125, Freon 125, R-125 |
CAS # | 354-33-6 |
ELINCS # (EU) | 206-557-8 |
Molecular Formula | C2HF5 |
Structure | CF3CHF2 |
Molecular Weight | 120.02 |
ODP(CFC-11 = 1) | 0 |
GWP100(CO2 = 1) | 675 |
Life Time (Years) | 5 |
TWA(8-hr) | 2.5 |
Product Description
Chemical Name | Pentafluoroethane |
Synonyms | HFC 125, Khladon 125, Suva 125, Freon 125, R-125 |
CAS # | 354-33-6 |
ELINCS # (EU) | 206-557-8 |
Molecular Formula | C2HF5 |
Structure | CF3CHF2 |
Molecular Weight | 120.02 |
ODP(CFC-11 = 1) | 0 |
GWP100(CO2 = 1) | 675 |
Life Time (Years) | 5 |
TWA(8-hr) | 2.5 |




