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Plasma Etching Gas

Pentafluoroethane is an important etching gas in the plasma etching process of the electronics industry.

Special Features:  

  • Ultra High Purity Tailored To Your Requirements

  • Excellent Etching Rate & Selectivity

Product Availability

Sample

Available

Commercial

Available

ISO Tank

Available

Custom Packaging

Upon Request


Product Description

Chemical Name

Pentafluoroethane

Synonyms

HFC 125, Khladon 125, Suva 125, Freon 125,

R-125

CAS #

354-33-6

ELINCS # (EU)

206-557-8

Molecular Formula

C2HF5

Structure

CF3CHF2

Molecular Weight

120.02

ODP(CFC-11 = 1)

0

GWP100(CO2 = 1)

675

Life Time (Years)

5

TWA(8-hr)

2.5


Product Description

Chemical Name

Pentafluoroethane

Synonyms

HFC 125, Khladon 125, Suva 125, Freon 125,

R-125

CAS #

354-33-6

ELINCS # (EU)

206-557-8

Molecular Formula

C2HF5

Structure

CF3CHF2

Molecular Weight

120.02

ODP(CFC-11 = 1)

0

GWP100(CO2 = 1)

675

Life Time (Years)

5

TWA(8-hr)

2.5


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