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Tetrafluoromethane | Semiconductor Etching Gas
Trifluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom | Available |
Product Description
Chemical Name | Tetrafluoromethane |
Synonyms | Perfluorocarbons, tetrafluoromethane, CFC 14, Dragon 14, R-14 |
CAS # | 75-73-0 |
ELINCS # (EU) | 200-896-5 |
Molecular Formula | CF4 |
Structure | CF4 |
Molecular Weight | 88.00 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 7390 |
Atmospheric Life Time (years) | 50,000 |
TWA（8-hr, mg/m³） | 2.5 |
Product Description
Chemical Name | Tetrafluoromethane |
Synonyms | Perfluorocarbons, tetrafluoromethane, CFC 14, Dragon 14, R-14 |
CAS # | 75-73-0 |
ELINCS # (EU) | 200-896-5 |
Molecular Formula | CF4 |
Structure | CF4 |
Molecular Weight | 88.00 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 7390 |
Atmospheric Life Time (years) | 50,000 |
TWA（8-hr, mg/m³） | 2.5 |