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Trifluoromethane | Semiconductor Etching Gas
Trifluoromethane is an important etching gas in the plasma etching process of the electronics industry.
Product Availability
Sample | Available |
Commercial | Available |
ISO Tank | Available |
Custom | Available |
Product Description
Chemical Name | Trifluoromethane |
Synonyms | Fluoroform, Fluoryl, Freon 23, Arcton-1, HFC-23, R-23 |
CAS # | 75-46-7 |
ELINCS # (EU) | 200-872-4 |
Molecular Formula | CHF3 |
Structure | CHF3 |
Molecular Weight | 70.01 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 12400 |
Atmospheric Life Time (Years) | 270 |
TWA（8-hr, mg/m3） | 2.5 |
Product Description
Chemical Name | Trifluoromethane |
Synonyms | Fluoroform, Fluoryl, Freon 23, Arcton-1, HFC-23, R-23 |
CAS # | 75-46-7 |
ELINCS # (EU) | 200-872-4 |
Molecular Formula | CHF3 |
Structure | CHF3 |
Molecular Weight | 70.01 |
ODP（CFC-11 = 1） | 0 |
GWP100（CO2 = 1） | 12400 |
Atmospheric Life Time (Years) | 270 |
TWA（8-hr, mg/m3） | 2.5 |